Electron-ion-ion triple-coincidence spectroscopic study of site-specific fragmentation caused by Si:2p core-level photoionization of F3SiCH2CH2Si(CH3)3 vapor

Physical Review A - Atomic, Molecular, and Optical Physics Volume 75 Issue 2 Page 020502-1-020502-4 published_at 2007-02-20
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Title ( eng )
Electron-ion-ion triple-coincidence spectroscopic study of site-specific fragmentation caused by Si:2p core-level photoionization of F3SiCH2CH2Si(CH3)3 vapor
Creator
Nagaoka Shin-ichi
Prümper Georg
Fukuzawa Hironobu
Hino Megumi
Takemoto Mai
Tamenori Yusuke
Harries James
Suzuki Isao H.
Tabayashi Kiyohiko
Liu Xiao-Jing
Lischke Toralf
Ueda Kiyoshi
Source Title
Physical Review A - Atomic, Molecular, and Optical Physics
Volume 75
Issue 2
Start Page 020502-1
End Page 020502-4
Abstract
Site-specific fragmentation caused by Si:2p core-level photoionization of F3SiCH2CH2Si(CH3)3 vapor was studied by means of high-resolution energy-selected-electron photoion-photoion triple-coincidence spectroscopy. The ab initio molecular orbital method was used for the theoretical description. F3SiCH2CH2+- Si(CH3)3+ ion pairs were produced by the 2p photoionization of the Si atoms bonded to the three methyl groups, and SiF+-containing ion pairs were produced by the 2p photoionization of the Si atoms bonded to the three F atoms.
Language
eng
Resource Type journal article
Publisher
American Physical Society
Date of Issued 2007-02-20
Rights
Copyright (c) 2007 The American Physical Society.
Publish Type Version of Record
Access Rights open access
Source Identifier
[ISSN] 1050-2947
[DOI] 10.1103/PhysRevA.75.020502
[NCID] AA10764867
[DOI] http://dx.doi.org/10.1103/PhysRevA.75.020502