On-machine identification of rotary axis location errors under thermal influence by spindle rotation
Precision Engineering Volume 55
Page 42-47
published_at 2019-01
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2021-02-01
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Title ( eng ) |
On-machine identification of rotary axis location errors under thermal influence by spindle rotation
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Creator |
Inui Hiroki
Hong Cefu
Nishikawa Shizuo
Shimoike Masahiro
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Source Title |
Precision Engineering
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Volume | 55 |
Start Page | 42 |
End Page | 47 |
Abstract |
Position and orientation errors of rotary axis average lines are often among dominant error contributors in the five-axis kinematics. Although many error calibration schemes are available to identify them on -machine, they cannot be performed when a machine spindle is rotating. Rotary axis location errors are often influenced by the machine’s thermal deformation. This paper presents the application of a non-contact laser light barrier system, widely used in the industry for tool geometry measurement, to the identification of rotary axis location errors, when the spindle rotates in the same speed as in actual machining applications. The effectiveness of the proposed scheme is verified by experimental comparison with the R-Test and a machining test. The uncertainty analysis is also presented.
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Keywords |
Machine tool
Metrology
Thermal deformation
Error calibration
Five-axis
Tool measurement
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Descriptions |
This work was supported by JSPS KAKENHI Grant NumberJP15K05721.
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Language |
eng
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Resource Type | journal article |
Publisher |
Elsevier
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Date of Issued | 2019-01 |
Rights |
© 2019. This manuscript version is made available under the CC-BY-NC-ND 4.0 license http://creativecommons.org/licenses/by-nc-nd/4.0/
This is not the published version. Please cite only the published version. この論文は出版社版でありません。引用の際には出版社版をご確認、ご利用ください。
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Publish Type | Author’s Original |
Access Rights | open access |
Source Identifier |
[ISSN] 0141-6359
[DOI] 10.1016/j.precisioneng.2018.08.005
[DOI] https://doi.org/10.1016/j.precisioneng.2018.08.005
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Remark | Post-print version/PDF may be used in an institutional repository after an embargo period of 24 months. |