Charge density distribution of transparent p-type semiconductor (LaO)CuS

Applied Physics Letters Volume 90 Issue 16 Page 161916-1-161916-3 published_at 2007-04-19
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Title ( eng )
Charge density distribution of transparent p-type semiconductor (LaO)CuS
Creator
Takase Kouichi
Sato Ken
Shoji Osamu
Takano Yoshiki
Sekizawa Kazuko
Goto Manabu
Source Title
Applied Physics Letters
Volume 90
Issue 16
Start Page 161916-1
End Page 161916-3
Abstract
The charge density distributions of layered oxysulfide (LaO)CuS, known as a p-type transparent semiconductor, have been investigated by analyzing the synchrotron radiation powder diffraction profile with the maximum entropy method/Rietveld method. The bonding character of the Cu–S bond is revealed to be covalent. Meanwhile, the O–La bonding has both ionic and covalent characters. The number of electrons estimated by integrating the charge density around each atom gave direct evidence that each CuS and LaO layer is electrically almost neutral.
Language
eng
Resource Type journal article
Publisher
American Institute of Physics
Date of Issued 2007-04-19
Rights
Copyright (c) 2007 American Institute of Physics.
Publish Type Version of Record
Access Rights open access
Source Identifier
[ISSN] 0003-6951
[DOI] 10.1063/1.2724891
[NCID] AA00543431
[DOI] http://dx.doi.org/10.1063/1.2724891