Spectroscopic study of debris mitigation with minimum-mass Sn laser plasma for extreme ultraviolet lithography
Applied Physics Letters 88 巻 17 号
2006-04-24 発行
アクセス数 : 779 件
ダウンロード数 : 207 件
今月のアクセス数 : 5 件
今月のダウンロード数 : 0 件
この文献の参照には次のURLをご利用ください : https://ir.lib.hiroshima-u.ac.jp/00018603
| ファイル情報(添付) | |
| タイトル ( eng ) |
Spectroscopic study of debris mitigation with minimum-mass Sn laser plasma for extreme ultraviolet lithography
|
| 作成者 |
Namba Shinichi
Fujioka Shinsuke
Nishimura Hiroaki
Yasuda Yuzuri
Nagai Keiji
Miyanaga Noriaki
Izawa Yasukazu
Mima Kunioki
|
| 収録物名 |
Applied Physics Letters
|
| 巻 | 88 |
| 号 | 17 |
| 抄録 |
An experimental study was made of a target consisting of the minimum mass of pure tin (sSn) necessary for the highest conversion to extreme ultraviolet (sEUV) light while minimizing the generation of plasma debris. The minimum-mass target comprised a thin Sn layer coated on a plastic shell and was irradiated with a Nd:YAG laser pulse. The expansion behavior of neutral atoms and singly charged ions emanating from the Sn plasma were investigated by spatially resolved visible spectroscopy. A remarkable reduction of debris emission in the backward direction with respect to the incident laser beam was demonstrated with a decrease in the thickness of the Sn layer. The optimal thickness of the Sn layer for a laser pulse of 9 ns at 7×1010 W/cm2 was found to be 40 nm, at which low-debris emission in the backward direction and a high conversion to 13.5 nm EUV radiation were simultaneously attained.
|
| 言語 |
英語
|
| 資源タイプ | 学術雑誌論文 |
| 出版者 |
American Institute of Physics
|
| 発行日 | 2006-04-24 |
| 権利情報 |
Copyright (c) 2006 American Institute of Physics.
|
| 出版タイプ | Version of Record（出版社版。早期公開を含む） |
| アクセス権 | オープンアクセス |
| 収録物識別子 |
[ISSN] 0003-6951
[DOI] 10.1063/1.2199494
[NCID] AA00543431
[DOI] http://dx.doi.org/10.1063/1.2199494
|
