広島大学歯学雑誌 28 巻 2 号
1996-12-01 発行

HPLC Analysis of Residual Monomers in Ternary Bis-GMAITEGDMA /Urethane Resin Systems

Chowdhury Niaz Ahmed
Wakasa Kunio
Rachmadi Priyawan
Yamaki Masao
全文
263 KB
jhuds_28-2_283.pdf
内容記述
This article was presented at the 78th Hiroshima Daigaku Shigakkai Reikai, Hiroshima City, on February 4, 1995.