A novel pulse-jet cleaning method to effectively extend the lifetime of pleated filter and reduce dust emission

Advanced Powder Technology Volume 35 Issue 5 Page 104456- published_at 2024-04-26
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Title ( eng )
A novel pulse-jet cleaning method to effectively extend the lifetime of pleated filter and reduce dust emission
Creator
Yu Zhenhui
Muraoka Yuki
Furumoto Kazuki
Liu Jingxian
Source Title
Advanced Powder Technology
Volume 35
Issue 5
Start Page 104456
Abstract
To solve the problem of poor cleaning effect of pleated filter, this study explored in detail the impact of various cleaning method on the filtration and cleaning performance of the filter media in clean-on-demand mode. Furthermore, the clogging mechanism of the filter and the deposition structure of dust on the filter media were analyzed based on the effective filtration area ratio and true resistance coefficient calculated by the proposed model. The results demonstrated that for the constant pulse-jet cleaning pressure (PJCP), increasing PJCP was more conducive to removing dust deposited on the filter media and improving regeneration efficiency, although higher PJCP increased power consumption. Different from the thick primary dust layer formed on the filter surface under the constant PJCP of 0.3 MPa, the dust was mainly deposited inside the filter media under the constant PJCP of 0.5 and 0.7 MPa. In contrast, stepwise increasing PJCP was more effective in cleaning and regenerating the filter media, which was reflected in further extending the filter lifetime, increasing the processing air volume and reducing the dust emission concentration with acceptable energy consumption. Moreover, the filter media mainly clogged itself and formed a medium thickness primary dust layer on the filter surface.
Keywords
Pleated filter
Pulse-jet cleaning pressure
Dust emission concentration
Effective filtration area ratio
Ture resistance coefficient
Descriptions
This work was partially supported by the Committee for Dust Collection Technology of the Association of Powder Process Industry and Engineering, Japan (APPIE). The first author express gratitude for the financial support provided by the China Scholarship Council (No. 202006080096) during his visit to Hiroshima University.
Language
eng
Resource Type journal article
Publisher
Elsevier
Date of Issued 2024-04-26
Rights
© 2024. This manuscript version is made available under the CC-BY-NC-ND 4.0 license https://creativecommons.org/licenses/by-nc-nd/4.0/
This is not the published version. Please cite only the published version.
この論文は出版社版ではありません。引用の際には出版社版をご確認、ご利用ください。
Publish Type Accepted Manuscript
Access Rights embargoed access
Source Identifier
[DOI] https://doi.org/10.1016/j.apt.2024.104456 isVersionOf
Remark The full-text file will be made open to the public on 26 April 2026 in accordance with publisher's 'Terms and Conditions for Self-Archiving'