Self-reducible copper complex inks with aminediol and OH-based solvent for the fabrication of a highly conductive copper film by calcination at low temperature under an air atmosphere
New Journal of Chemistry Volume 44
Page 19880-19884
published_at 2020-10-28
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Title ( eng ) |
Self-reducible copper complex inks with aminediol and OH-based solvent for the fabrication of a highly conductive copper film by calcination at low temperature under an air atmosphere
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Creator |
Sakaguchi Takuhiro
Indra Wahyudhin Fathona
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Source Title |
New Journal of Chemistry
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Volume | 44 |
Start Page | 19880 |
End Page | 19884 |
Abstract |
A simple fabrication of copper conductive film was accomplished in one step at low temperature under an air atmosphere. The strategy for solving the problem was the use of both aminediol and OH-based solvent for self-reducible copper complex inks. The complex ink consisted of copper formate, aminediol, and various OH-based solvents calcinated at various temperatures, which resulted in a conductive copper film via rapid calcination at low temperature. The ratio of copper formate, aminediol, and OH-based solvent in complex inks was optimized for a higher conductive copper film. The copper film from the complex ink with a ratio of 1 (copper formate) : 2.2 (aminediol) : 1.8 (diol solvent) was rapidly calcined at 180 °C under an air atmosphere and showed approximately 15 μΩ cm, which is approximately 10 times that of bulk copper. The combination of aminediol and OH-based solvent inhibited the oxidation of the copper surface via adsorption. The developed process is applicable to conductive circuits, resistors, and capacitors in the form of oxide films for use as printable electronics fabricated under an air atmosphere.
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Language |
eng
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Resource Type | journal article |
Publisher |
Royal Society of Chemistry
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Date of Issued | 2020-10-28 |
Rights |
This is not the published version. Please cite only the published version. この論文は出版社版ではありません。引用の際には出版社版をご確認、ご利用ください。
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Publish Type | Author’s Original |
Access Rights | open access |
Source Identifier |
[ISSN] 1144-0546
[ISSN] 1369-9261
[DOI] 10.1039/D0NJ04725B
[DOI] https://doi.org/10.1039/D0NJ04725B
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