Suppression of particle generation in a plasma process using a sine-wave modulated rf plasma

Kashihara Nobuki

Setyawan Heru

Shimada Manabu

Hayashi Yutaka

Kim Chan Soo

Okuyama Kikuo

Winardi Sugeng

Journal of Nanoparticle Research

Sine-wave modulated rf plasma has been used to control particle generation and growth in a plasma-enhanced chemical vapor deposition of silicon dioxide thin films using TEOS/O2. The density and the size of particles generated in the plasma are greatly reduced when the plasma is modulated with sine-wave modulation at low modulation frequency (<1000 Hz). In addition, particle contamination on the films is significantly reduced also for nanoparticles, and the film growth rates at the range of modulation frequencies where particle generation are greatly reduced do not decrease appreciably. Compared to its counterpart pulse-wave modulation plasma, the sine-wave modulation plasma has demonstrated a better performance in terms of reduction of particle generation and film contamination, and of film growth rate. Thus, the sine-wave modulation plasma has shown as a promising method to be applied in the production of thin film with a high deposition rate and a low particle contamination.

Nanoparticle

Particle generation control

Plasma reactor

Sine-wave modulation

Chemistry [ 430 ]

eng

Springer

Copyright (c) 2006 Springer "The original publication is available at www.springerlink.com"

[DOI] 10.1007/s11051-005-9005-1

[ISSN] 1388-0764

[NCID] AA11551748

[DOI] http://dx.doi.org/10.1007/s11051-005-9005-1 isVersionOf