ギ酸添加浴を用いた高効率高速クロムめっき II. 光沢クロムめっき形成に及ぼす電極表面の3価クロムイオン濃度の影響 <研究論文>

表面技術 55 巻 2 号 139-144 頁 2004-02-01 発行
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タイトル ( jpn )
ギ酸添加浴を用いた高効率高速クロムめっき II. 光沢クロムめっき形成に及ぼす電極表面の3価クロムイオン濃度の影響 <研究論文>
タイトル ( eng )
High-Efficient and High-Speed Chromium Deposition in a Formic Acid Bath II. Influence of Chromium Ion Concentration in the Vicinity of the Cathode on the Appearance of Chromium Deposits
作成者
安部 了介
松村 昌信
収録物名
表面技術
55
2
開始ページ 139
終了ページ 144
抄録
A defect associated with the use of the Sargent bath, a widely-used device for chromium plating, is the substantially lower current efficiency of chromium, compared to that of other metals. It has been reported that the use of a formic acid bath leads to the production of amorphous-structured chromium deposits with a higher current efficiency. However, it is difficult to use this process commercially, because of difficulties involved in maintaining the bath. In this paper, the concentration of Cr3+ ion in the vicinity of the cathode in a formic acid bath was estimated from the current density, the aging time of the bath and the rotating speed of the rotating disk electrode (RDE) apparatus. The results show that Cr3+ concentration plays the most important role in determining the appearance of the deposited metal. The effect of formic acid and sulfuric acid on the chromium deposit was investigated, and the optimum Cr3+ concentration in the vicinity of the cathode on the chromium deposition process was determined. Taking these results into account, the conditions required for obtaining a bright deposit with a high current efficiency at a high deposition rate could be predicted, resulting in a bright deposit with a current efficiency of 64.8-0x1.fe3a0000008p+0t a deposition rate of 17.1μm/min.
著者キーワード
High Current Efficiency
High Speed Deposition
Chromium Ion Concentration
Current Density
Rotating Disk Electrode
NDC分類
金属工学・鉱山工学 [ 560 ]
言語
日本語
資源タイプ 学術雑誌論文
出版者
表面技術協会
発行日 2004-02-01
権利情報
本文データは学協会の許諾に基づきJ-STAGEから複製したものである
Copyright (c) 2005 (社)表面技術協会
出版タイプ Version of Record(出版社版。早期公開を含む)
アクセス権 オープンアクセス
収録物識別子
[ISSN] 0915-1869
[DOI] 10.4139/sfj.55.139
[NCID] AN1005202X
[DOI] http://dx.doi.org/10.4139/sfj.55.139