Investigation on the Mechanism of Millisecond Solid Phase Crystallization of Silicon Films Formed by Micro-Thermal-Plasma-Jet and Their Application to Bottom-Gate Thin Film Transistors
Use this link to cite this item : https://ir.lib.hiroshima-u.ac.jp/00051851
| ID | 51851 |
| file | |
| title alternative | 大気圧マイクロ熱プラズマジェット照射によるシリコン薄膜のミリ秒結晶化メカニズムの解明とボトムゲート型薄膜トランジスタへの応用
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| creator |
Nguyen, Hoa Thi Khanh
|
| language |
eng
|
| nii type |
Thesis or Dissertation
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| HU type |
Doctoral Theses
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| DCMI type | text
|
| format | application/pdf
|
| text version | ETD
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| grantid | 甲第8673号
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| degreeGrantor | 広島大学(Hiroshima University)
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| degreename Ja | 博士(工学)
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| degreename En | Doctor of Engineering
|
| degreelevel | doctoral
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| date of granted | 2021-09-17
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| department |
Graduate School of Advanced Sciences of Matter
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