ギ酸添加浴を用いた高効率高速クロムめっき II. 光沢クロムめっき形成に及ぼす電極表面の3価クロムイオン濃度の影響 <研究論文>

表面技術 Volume 55 Issue 2 Page 139-144 published_at 2004-02-01
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Title ( jpn )
ギ酸添加浴を用いた高効率高速クロムめっき II. 光沢クロムめっき形成に及ぼす電極表面の3価クロムイオン濃度の影響 <研究論文>
Title ( eng )
High-Efficient and High-Speed Chromium Deposition in a Formic Acid Bath II. Influence of Chromium Ion Concentration in the Vicinity of the Cathode on the Appearance of Chromium Deposits
Creator
Abe Ryosuke
Matsumura Masanobu
Source Title
表面技術
Volume 55
Issue 2
Start Page 139
End Page 144
Abstract
A defect associated with the use of the Sargent bath, a widely-used device for chromium plating, is the substantially lower current efficiency of chromium, compared to that of other metals. It has been reported that the use of a formic acid bath leads to the production of amorphous-structured chromium deposits with a higher current efficiency. However, it is difficult to use this process commercially, because of difficulties involved in maintaining the bath. In this paper, the concentration of Cr3+ ion in the vicinity of the cathode in a formic acid bath was estimated from the current density, the aging time of the bath and the rotating speed of the rotating disk electrode (RDE) apparatus. The results show that Cr3+ concentration plays the most important role in determining the appearance of the deposited metal. The effect of formic acid and sulfuric acid on the chromium deposit was investigated, and the optimum Cr3+ concentration in the vicinity of the cathode on the chromium deposition process was determined. Taking these results into account, the conditions required for obtaining a bright deposit with a high current efficiency at a high deposition rate could be predicted, resulting in a bright deposit with a current efficiency of 64.8-0x1.fe3a0000008p+0t a deposition rate of 17.1μm/min.
Keywords
High Current Efficiency
High Speed Deposition
Chromium Ion Concentration
Current Density
Rotating Disk Electrode
NDC
Metal and mining engineering [ 560 ]
Language
jpn
Resource Type journal article
Publisher
表面技術協会
Date of Issued 2004-02-01
Rights
本文データは学協会の許諾に基づきJ-STAGEから複製したものである
Copyright (c) 2005 (社)表面技術協会
Publish Type Version of Record
Access Rights open access
Source Identifier
[ISSN] 0915-1869
[DOI] 10.4139/sfj.55.139
[NCID] AN1005202X
[DOI] http://dx.doi.org/10.4139/sfj.55.139