このエントリーをはてなブックマークに追加
ID 15361
file
creator
Kashihara, Nobuki
Setyawan, Heru
Hayashi, Yutaka
Kim, Chan Soo
Winardi, Sugeng
subject
Nanoparticle
Particle generation control
Plasma reactor
Sine-wave modulation
NDC
Chemistry
abstract
Sine-wave modulated rf plasma has been used to control particle generation and growth in a plasma-enhanced chemical vapor deposition of silicon dioxide thin films using TEOS/O2. The density and the size of particles generated in the plasma are greatly reduced when the plasma is modulated with sine-wave modulation at low modulation frequency (<1000 Hz). In addition, particle contamination on the films is significantly reduced also for nanoparticles, and the film growth rates at the range of modulation frequencies where particle generation are greatly reduced do not decrease appreciably. Compared to its counterpart pulse-wave modulation plasma, the sine-wave modulation plasma has demonstrated a better performance in terms of reduction of particle generation and film contamination, and of film growth rate. Thus, the sine-wave modulation plasma has shown as a promising method to be applied in the production of thin film with a high deposition rate and a low particle contamination.
journal title
Journal of Nanoparticle Research
volume
Volume 8
issue
Issue 3-4
start page
395
end page
403
date of issued
2006-08
publisher
Springer
issn
1388-0764
ncid
publisher doi
language
eng
nii type
Journal Article
HU type
Journal Articles
DCMI type
text
format
application/pdf
text version
author
rights
Copyright (c) 2006 Springer "The original publication is available at www.springerlink.com"
relation is version of URL
http://dx.doi.org/10.1007/s11051-005-9005-1
department
Graduate School of Engineering



Last 12 months's access : ? times
Last 12 months's DL: ? times


This month's access: ? times
This month's DL: ? times