ギ酸添加浴を用いた高効率高速クロムめっき I. 静止試験片と回転試験片 <研究論文>

表面技術 55 巻 1 号 65-70 頁 2004-01-01 発行
アクセス数 : 888
ダウンロード数 : 221

今月のアクセス数 : 4
今月のダウンロード数 : 3
ファイル情報(添付)
SFJ_55_65.pdf 609 KB 種類 : 全文
タイトル ( jpn )
ギ酸添加浴を用いた高効率高速クロムめっき I. 静止試験片と回転試験片 <研究論文>
タイトル ( eng )
High-Efficient and High-Speed Chromium Deposition in a Formic Acid Bath I. Static and Rotating Specimens
作成者
菰田 進一郎
松村 昌信
収録物名
表面技術
55
1
開始ページ 65
終了ページ 70
抄録
A defect associated with the use of a Sargent bath, a widely used chromium plating device, is the substantially lower current efficiency of chromium compared to that of other metals. It has been reported that the use of a formic acid bath leads to the production of amorphous-structured chromium deposits with a higher current efficiency. However, it is difficult to use this process commercially, because of difficulties involved in maintaining the bath. The purpose of this study was to examine in detail the conditions for chromium deposition in a formic acid bath with the objective of developing an optimum plating method with a higher current efficiency and a higher deposition rate. In order to realize a higher deposition rate, the effect of agitating the solution, via the use of a rotating disk electrode (RDE) apparatus, was examined. The findings show that the rate of deposition and current efficiency increased with increasing current density. By rotating the specimen, however, plating with bright surfaces was obtained more easily and under a wide variaty of plating conditions. The appearance of the surface of the deposited chromium was affected by the current density, the aging time of the solution used, and the rotating speed. We conclude that the morphology of the deposited chromium is closely related to the Cr3+ concentration in the proximity of the surface of the specimen.
著者キーワード
Chromium
High Current Efficiency
High Speed Deposition
Formic Acid Bath
Aging Time
NDC分類
金属工学・鉱山工学 [ 560 ]
言語
日本語
資源タイプ 学術雑誌論文
出版者
表面技術協会
発行日 2004-01-01
権利情報
Copyright (c) 2005 (社)表面技術協会
本文データは学協会の許諾に基づきJ-STAGEから複製したものである
出版タイプ Version of Record(出版社版。早期公開を含む)
アクセス権 オープンアクセス
収録物識別子
[ISSN] 0915-1869
[DOI] 10.4139/sfj.55.65
[NCID] AN1005202X
[DOI] http://dx.doi.org/10.4139/sfj.55.65